Polymer Electronic Materials Lab

• Wafer cleaning simply means removal of particles and contamination

• Purpose of wafer cleaning is remove the particles and impurities on the silicon substrates without damage

• Particle contaminants and impurities affect device performance,  product yield and reliability, therefore it is important to clean substrate surface

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• Representatively, there are two methods for wafer cleaning process such as wet clearing and dry cleaning

• Wet cleaning is normally used for wafer cleaning due to excellent particle removal efficiency for organic and inorganic contaminants

• However, there is environment issues on wet cleaning of silicon surfaces

• Therefore, eco-friendly wafer cleaning technology is required in the current industry